Guangzhou Sanxin Metal S & T Co., Ltd.
Main products:Thermal Spray Equipment,Induction Heating Equipment
Products
Contact Us
  • Contact Person : Mr. Wu Hong
  • Company Name : Guangzhou Sanxin Metal S & T Co., Ltd.
  • Tel : 86-20-34801184
  • Fax : 0086-20-28651601
  • Address : Guangdong,Guangzhou,No. 1, North Side of 1/F, Building A5, No. 2, North of Dongxian Road, Shitou Village, Nancun Town, Panyu District
  • Country/Region : China
  • Zip : 510000

Target material made of plasma spraying production line

Target material made of plasma spraying production line
Product Detailed
Target material made of plasma spraying production line

Target material made of plasma spraying production line

 

Plasma spray target materials silicon aluminium equipment

 

Supply line-coating target material spraying and advanced production equipment technology

Production line-coating target material spraying and manufacturing equipment technical characteristics:

Used in glass coating (construction glass and automobile glass) industry

Products are exported to southeast Asia as well as improve the rate of becomes microwave plasma sputtering, now commonly used have electron cyclotron resonance (ECR) type microwave plasma sputtering.

Magnetron sputtering film coating is a new type of physical gas phase coating way, earlier than is the evaporation of the coating way, its many advantages quite obvious. As a have a mature technology development, magnetron sputtering has been used in many fields.

 

Magnetron sputtering principle: the sputtering target extremely (cathode) and between anode and a orthogonal magnetic and electric fields, and the high vacuum chamber filling into the need of inert gas (usually for Ar gas), permanent magnets in target material surface form 250 to 350 gauss magnetic field, the electric field with high pressure of orthogonal electromagnetic field. In the electric field under the action of Ar gas into positive ions and ionization electronic, target and have certain negative pressure, from a target is by the role of the magnetic field of electronic and work of the gas ionization increase risk, in the form of high density near plasma, Ar, ion in the lorentz under the action of forces to speed up the target surface fly, at high speed to the target surface bombardment, make the target was sputtering out of the atomic follow momentum transfer principle with higher kinetic energy from the target surface to fly to the substrate deposition film. Magnetron sputtering typically divided into two kinds: tributaries sputtering and rf sputtering, including tributaries sputtering equipment principles simple, in sputtering metal, its rate and fast. And the use of rf sputtering wider range, besides sputtering conductive materials outside, also can be the conductive materials sputtering, and company reacted sputtering preparation oxide, nitrides and carbide chemical compounds such as material. If the frequency of the rf

Production line-coating target material spraying and manufacturing equipment technology to form:

By using plasma spraying (provide SX ~ R automatic sand blasting equipment, SX ~ 30 KW automatic spraying equipment, series of configuration target material spraying silicon aluminium system equipment and technology, spraying room configuration design, and other advanced scheme)

Production line-coating target material spraying and manufacturing equipment technology application domain:

This company USES the method of plasma spraying production target, professional development, production and sales vacuum magnetron sputtering target materials, used in glass coating (construction glass and automobile glass) industry and other industries, the main target materials including: chrome target, titanium target, silicon aluminium target, the company may according to the customer request developed to meet customer requirements of various target material spraying manufacturing technology and provide:

 

* chromium target, titanium target, silicon aluminium target of spraying manufacturing technology solutions

 

* chromium target, titanium target, silicon aluminium target of spraying process and parameters

 

* chromium target, titanium target, silicon aluminium target of spraying technology worker training

 

* target material made of plasma spraying production line turndey engineering

 

* tube manufacturing various tooling target spraying, clamp design and processing

 

* target material of plasma spraying powder type selection, proportion, the powder technology

 

* target materials plasma spraying powder equipment turn-key project

 

Production line-coating target material spraying and manufacturing equipment technical processing series:

Magnetron sputtering film coating target materials: metal sputtering film coating target materials, alloy sputtering film coating target materials, ceramic sputtering film coating target materials, boron carbide ceramic sputtering target materials, carbide ceramic sputtering target materials, ceramic sputtering fluoride target materials, nitride ceramic sputtering target materials, the oxide ceramic target materials, selenium iodide ceramic sputtering target materials, silicides ceramic sputtering target materials, ceramic sputtering sulfide target materials, ceramic sputtering tellurium iodide target materials, other ceramic target materials, mixed with a oxidation silicon chromium ceramic target materials (Cr-SiO), base-collector target materials (InP), gaas-on-gaas lead target materials (PbAs), gaas-on-gaas indium target materials (InAs).

High purity high-density construction target materials are: sputtering target materials (purity: 99.9% 99.999%)

Metal target materials: nickel target, Ni, titanium target, Ti, zinc target, Zn, chromium target, Cr, magnesium target, Mg, niobium target, Nb, tin target, Sn, aluminum target, Al, indium target, In, iron target, Fe, zirconium aluminum target, ZrAl, titanium aluminium target, TiAl, zirconium target, Zr, aluminum silicon target, AlSi, silicon target, Si, copper target Cu, tantalum target T, a, Ge target, Ge, silver target, Ag, cobalt target, Co, gold target, Au, including gadolinium target, Gd, La, Y La target, target, Y, Ce target, Ce, tungsten target, w, stainless steel target, nickel chrome target, NiCr, Ha target, Hf, mammography, Mo, iron, nickel, tungsten target FeNi target, w, etc.

Service and quality acceptance:

A target materials, plasma spraying powder equipment turn-key project

B, plasma spraying powder target material selection, proportion, the powder technology

 

1, equipment installation and operator training. With the safety equipment quality warranty period.

 

2, our quality policy is: "with satisfactory products and sincere service, distinct characteristics, meet the demand of customers".

 

3, enterprise with complete before the sale of after-sales service system, the company also provides warranty period of maintenance, after maintenance services (only charge the corresponding cost).

 

4, we will provide you perfect service enthusiasm accurately and timely, make great efforts to meet and exceed your expectations and requirements. Please contact with us immediately.

WEB ADDRESS:http://en.sanxin086.com

 

Target material made of plasma spraying production line



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